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High Yield Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering

Categories PVD Vacuum Coating Machine
Brand Name: ROYAL
Model Number: RTAS
Certification: CE
Place of Origin: China
MOQ: 1 set
Supply Ability: 10 sets per month
Delivery Time: 14~16weeks
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Technology: Arc ion plating + PVD sputtering deposition
Targets: TiAl, Ta, Ni, Cr, Ti, Au, Ag, SS, Cu, Zr, Al etc.
Properties: High Yield, High uniformity, high target utilization
Application: Multiple layer films deposition
Advantages: Environmentally friendly operating process
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    High Yield Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering

    Tantalum PVD Sputtering Coating Machine, Tantalum films deposited by DC Magnetron Sputtering, PVD Tantalum Plating

    Tantalum is most widely used in the electronic industry and as a protective coating in many industries because of its good resistance to erosion.

    Sputtered tantalum films are widely used in the
    1. Microelectronics industry as the films can be reactively sputtered and thus resistivity and temperature coefficient of resistance can be controlled;

    2. Medical instruments like body implants for its highly biocompatability property;

    3. Coatings on corrosion resistant parts, such as thermowells, valve bodies, and fasteners;

    Sputtered tantalum can be also be used as an effective corrosion resistance barrier if the coating is continuous, defectected and is adherent to the substrate is intended to protect.

    Royal Technology designed and built 2 models PVD magnetron sputtering system for customers exclusively application.

    RTAS1200 and RTAS1000 models.

    Ta Sputtering deposition machine design features:

    Robust Design, Stable Quality, Fast Cycle, Fast Cycle Time, High deposition speed

    Main Configurations
    TECHNOLOGYDC magnetron sputtering + Cathodic arc plating
    CHAMBER MATERIALStainless Steel (S304)
    CHAMBER SIZEΦ1000*1600mm (H)
    CHAMBER TYPED shape, cylindrical chamber
    ROTATION RACK & JIG SYSTEMSatellite driving or central driving system
    POWER SUPPLIESDC Sputtering Power Supply: 2~4 sets Bias Power supply: 1 set Arc Power supply: 11 sets
    DEPOSITION MATERIALTi/Cr/TiAl, Ta, Au, Ag, Cu etc.

    Planar Sputtering Cathodes + circular arc cathodes

    Remark: cylinderial DC sputter is avaliable

    CONTROLPLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
    PUMP SYSTEMRotary Vane Pump: SV300B - 1 set (Leybold)
    Roots Pump: WAU1001 - 1 set (Leybold)
    Holding Pump: D60C - 1 set (Leybold)
    Magnetic Suspension Molecular Pump: MAG2200 - 2 sest (Leybold)
    GAS MASS FLOW CONTROLLER4 channels, Made in China, Seven Star (CS series, ) digital model (Ar, N2, O2, C2H2)
    VACUUM GAUGEModel: ZDF-X-LE, Made in China
    SAFETY SYSTEMNumerous safety interlocks to protect operators and equipmen
    HEATINGHeaters: 20KW. Max. temp.: 450℃
    COOLINGIndustrial Chiller (Cold Water)
    POWER MAX.100KW (Approx.)
    GROSS WEIGHTT (Approx.)
    FOOT PRINT( L*W*H) 4000*4000 *3600 MM
    POWER ELECTRICALAC 380V/3 phases/50HZ / 5 line

    Cylindrical sputtering cathodes Planar sputtering cathodes

    Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.

    Download the brochure, please click here: Magnetron Sputtering Deposition System.pdf
    Magnetron Sputtering Deposition system applicatio...

    Cheap High Yield Tantalum PVD Sputtering Coating Machine DC Magnetron Sputtering for sale
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